Extreme ultraviolet lithography's path to manufacturing

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Levinson, Harry J ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Extreme ultraviolet (EUV); Lithography; Masks

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MANUFACTURE;

EXTREME ULTRAVIOLETS; MASK DEFECTS; PILOT LINE; VOLUME MANUFACTURING;

LITHOGRAPHY;

EID: 77953530307     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3273965     Document Type: Article

References (50)

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