Characterization of EUV optics contamination due to photoresist related outgassing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Pollentier, I ^a   Goethals, A M ^a   Gronheid, R ^a   Steinhoff, J ^b   Van Dijk, J ^b  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

Author keywords

contamination; EUV; outgassing; photoresist qualification; RGA; witness sample

Indexed keywords

ANALYSIS TECHNIQUES; CONTAMINATION GROWTH; EUV LITHOGRAPHY; EUV OPTICS; EXPOSURE TOOL; EXTREME ULTRAVIOLETS; HIGH VOLUME MANUFACTURING; MATERIAL ANALYSIS; OUTGASSING; PHOTORESIST MATERIALS; PRESSURE RISE; RELATED RISK; RESIDUAL GAS ANALYSIS; SOLID BASIS; TEST EQUIPMENTS; TEST METHOD; WITNESS SAMPLE;

DEGASSING; EXPOSURE METERS; LITHOGRAPHY; PHOTORESISTS;

CONTAMINATION;

EID: 77953378369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846842     Document Type: Conference Paper

References (5)

1. Dean, K., Nishiyama, I., Oizumi, H., Keen, A., Cao, H., Yueh, W., Watanabe, T., Lacovig, P., Rumiz, L., Denbeaux, G., and Simon, J., 'An analysis of EUV resist outgassing measurements', Proc. SPIE 6519, 6519P-1 (2007).
2. Kobayashi, S., Santillan, J., and Itani, T., 'Quantitative analysis of EUV resist outgassing', Proc. SPIE6923, p. 692345 (2008).
3. Tarrio, C., Pollentier, I., Mbanaso, C., Denbeaux, G. and Antohe,A., 'Summary of OS1 outgassing results by NIST, IMEC, and CNSE', presented at EUVI Resist TWG (February, 2009)
4. Pollentier, I., Berger, M., Gronheid, R., Goethals, A.-M., and Leeson, M., 'Characterization of EUV resist related outgassing and contamination', EUVL Symposium Prague (2009).
5. Harned, N., 'Mirror reflectivity loss and resist outgassing rates', presented at EUVI Optics Lifetime and Contamination TWG (February, 2008).