Novolak resins and the microelectronic revolution

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 3, 2008, Pages

  Wanat, Stanley F ^a,b   Plass, Robert R ^a   Rahman, M Dalil ^a  

^a AZ Electronic Materials USA Corp   (United States)

^b Union County College   (United States)

Author keywords

Fractionation; Novolak; Photoresist; Purification; Resin; Stability; Synthesis

Indexed keywords

MICROELECTRONICS; PHOTORESISTS; PURIFICATION;

CONTINUOUS PROCESSING; DIAZONAPHTHOQUINONE; NEGATIVE PHOTORESISTS; NOVOLAK; NOVOLAK RESIN; SIGNIFICANT IMPACTS; STABILIZATION TECHNIQUES;

RESINS;

EID: 80055048391     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2968268     Document Type: Article

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