Self-assembling materials for lithographic patterning: Overview, status and moving forward

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Hinsberg, William ^a   Cheng, Joy ^a   Kim, Ho Cheol ^a   Sanders, Daniel P ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

block copolymers; directed self assembly; self assembly

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; CURRENT STATUS; DESIGN ISSUES; DIRECTED SELF-ASSEMBLY; LITHOGRAPHIC PATTERNING; SELF-ASSEMBLING MATERIALS;

BLOCK COPOLYMERS; COPOLYMERIZATION; SURVEYS;

SELF ASSEMBLY;

EID: 77953307294     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.852230     Document Type: Conference Paper

References (30)

1. http://en.wikipedia.org/wiki/Self-assembly
2. A. Kumar, H. A. Biebuyck and G. M. Whitesides, Langmuir, 10, 1498 (1994).
3. W. J. Dressick and J.M. Calvert, Jpn. J. Appl. Phys., 32, 5829 (1993).
4. S. L. Brandow, M-S. Chen, C. S. Dulcey, and W. J. Dressick, Langmuir, 24, 3888 (2008).
5. J. H. Hah, S. Mayya, M. Hata, H-W. Kim, M-H. Ryoo, S-G. Woo, H-K. Cho, J-T. Moon and B-I. Ryu, Proc. SPIE, 5753, 162 (2005).
6. G. Decher, Science, 277, 1232 (1997).
7. P. Mansky, P. Chaikin and E. L. Thomas, J. Mater. Sci., 30, 1987 (1995)
8. P. Mansky, C.K. Harrison, P.M. Chaikin, R.A. Register and N. Yao, Appl. Phys. Lett., 68, 2586 (1996).
9. M. Park, C.K. Harrison, P.M. Chaikin, R.A. Register and D.H. Adamson, Science, 276, 1401 (1997).
10. L. Rockford, Y. Liu, P. Mansky, T. P. Russell, M. Yoon, and S. G. J. Mochrie, Phys. Rev. Lett., 82, 2602 (1999).
11. S.O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. De Pablo and P. F. Nealey, Nature, 424, 411 (2003).
12. R. A. Segalman, H. Yokoyama, and E. J. Kramer, Adv. Mater., 13, 1152 (2001).
13. J. Y. Cheng, C. A. Ross, E. L. Thomas, H. I. Smith, and G. J. Vansco, Appl. Phys. Lett., 81, 3657 (2002).
14. D. Sundrani, S.B. Darling, and S.J. Sibener, Nano Lett., 4, 273 (2004).
15. C. T. Black, K. W. Guarini, K. R. Milkove, S. M. Baker, T. P. Russell and M. T. Tuominen, Appl. Phys. Lett., 79, 409 (2001).
16. K. W. Guarini, C. T. Black, Y. Zhang, I. V. Babich, E. M. Sikorski and L. M. Gignac, IEEE Int. Electron Device Meeting 2003, 541.
17. C. T. Black, Appl. Phys. Lett., 87, 163116 (2005).
18. K.Naito, H.Hieda, M.Sakurai, Y.Kamata, and K.Asakawa, IEEE Trans Magn., 38, 1949 (2002).
19. C.-C. Liu, P. F. Nealey, Y. H. Ting and A. E. Wendt, J. Vac. Sci. Techn. B., 25, 1963 (2007).
20. C. T. Black and R. Ruiz, Proc. SPIE, 6153, 615302 (2006).
21. E. M. Freer, L. E. Krupp, W. D. Hinsberg, P. M. Rice, J. L. Hedrick, J. N. Cha, R. D. Miller, and H. Kim, Nano Lett., 5, 2014 (2005).
22. A.M. Welander, H. Kang, K.O. Stuen, H.H. Solak, M. Müller, J.J. de Pablo, and P.F. Nealey, Macromol. 41, 2759 (2008).
23. J. Y. Cheng, C. T. Rettner, D. P. Sanders, H-C. Kim and W. D. Hinsberg, Adv. Mater., 20, 3155 (2008).
24. T. Yamaguchi and H. Yamaguchi, J. Photopolym. Sci. Technol., 19, 38 (2006).
25. C. T. Black, Appl. Phys. Lett., 87, 163116 (2005).
26. R. Ruiz, H. M. Kang, F. A. Detcheverry, E. Dobisz, D. S. Kercher, T. R. Albrecht, J. J. de Pablo and P. F. Nealey, Science, 321, 936 (2008).
27. Y. Tada, S. Akasaka, H. Yoshida, H. Hasegawa, E. Dobisz, D. Kercher and M. Takenaka, Macromol. 41, 9267 (2008).
28. Y. Borodovsky, "Industrial Leadership through Incremental and Complementary Innovations-Moore's Law Lessons for Nanotechnology", 2nd Nanotechnology International Forum, Moscow, October 2009.
29. P. Xie and B. W. Smith, Proc. SPIE, 7274, 72741Y-1 (2009).
30. L. Liebmann, L. Pileggi, J. Hibbeler, V. Rovner, T. Jhaveri and G. Northrop, Proc. SPIE, 7275, 72750A (2009).