Cure-induced photoresist distortions in double patterning

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 1, 2009, Pages

  Wallow, Thomas I ^a   Rayasam, Mahidhar ^a   Yamaguchi, Masanori ^b   Yamada, Yohei ^b   Kim, Ryoung Han ^a   Kye, Jongwook ^a   Levinson, Harry J ^a  

^a ADVANCED MICRO DEVICES   (United States)

^b USHIO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; PHOTORESISTS; SHRINKAGE; STABILIZATION;

BEAM STRUCTURES; CURING PROCESS; DOUBLE PATTERNING; IN-PROCESS; LINE ENDS; PATTERN DISTORTION; SEMI-QUANTITATIVE; SIMULATION-BASED METHOD; STABILIZATION METHODS; THREE-DIMENSIONAL PATTERNS; TRACK-BASED;

CURING;

EID: 80455128721     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3094746     Document Type: Article

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