SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

Development of new positive-tone molecular resists based on fullerene derivatives for extreme ultraviolet lithography

(4) Oizumi, Hiroaki a Tanaka, Katsutomo b Kawakami, Kiminori b Itani, Toshiro a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

b MITSUBISHI CHEMICAL CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

45-NM HALF-PITCH; EXCELLENT SOLUBILITY; EXPOSURE DOSE; FULLERENE DERIVATIVE; LINEWIDTH ROUGHNESS; MOLECULAR RESISTS; ORGANIC UNDERLAYER; PATTERN COLLAPSE; PHOTOACID GENERATORS; POSITIVE-TONE;

PHOTORESISTS; ROUGHNESS MEASUREMENT;

FULLERENES;

EID: 77955321321 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.06GF04 Document Type: Article

Times cited : (21)

References (54)

1
- 77955336392
- presented at
- R. Hartman: presented at 8th Int. Extreme Ultraviolet Lithography Symp., 2009.
- (2009) 8th Int. Extreme Ultraviolet Lithography Symp.
- Hartman, R.¹

2
- 0141500074
- W. Hinsberg, F. Houle, M. Sanchez, J. Hoffnagle, G. Wallraff, D. Medeiros, G. Gallatin, and J. Cobb: Proc. SPIE 5039 (2003) 1.
- (2003) Proc. SPIE , vol.5039 , pp. 1
- Hinsberg, W.¹ Houle, F.² Sanchez, M.³ Hoffnagle, J.⁴ Wallraff, G.⁵ Medeiros, D.⁶ Gallatin, G.⁷ Cobb, J.⁸

3
- 0037676507
- T. Yoshimura, H. Shiraishi, J. Yamamoto, and S. Okazaki: Appl. Phys. Lett. 63 (1993) 764.
- (1993) Appl. Phys. Lett. , vol.63 , pp. 764
- Yoshimura, T.¹ Shiraishi, H.² Yamamoto, J.³ Okazaki, S.⁴

4
- 11744364248
- H. Namatsu, M. Nagase, T. Yamaguchi, K. Yamazaki, and K. Kurihara: J. Vac. Sci. Technol. B 16 (1998) 3315.
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3315
- Namatsu, H.¹ Nagase, M.² Yamaguchi, T.³ Yamazaki, K.⁴ Kurihara, K.⁵

5
- 0001512129
- J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui: Appl. Phys. Lett. 68 (1996) 1297.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 1297
- Fujita, J.¹ Ohnishi, Y.² Ochiai, Y.³ Matsui, S.⁴

6
- 0029757019
- T. Tada and T. Kanayama: Jpn. J. Appl. Phys. 35 (1996) L63.
- (1996) Jpn. J. Appl. Phys. , vol.35
- Tada, T.¹ Kanayama, T.²

7
- 0000274144
- M. Yoshiiwa, H. Kageyama, Y. Shirota, F. Wakaya, K. Gamo, and M. Takai: Appl. Phys. Lett. 69 (1996) 2605.
- (1996) Appl. Phys. Lett. , vol.69 , pp. 2605
- Yoshiiwa, M.¹ Kageyama, H.² Shirota, Y.³ Wakaya, F.⁴ Gamo, K.⁵ Takai, M.⁶

8
- 0041934994
- T. Nakayama, K. Haga, O. Haba, and M. Ueda: Chem. Lett. 26 (1997) 265.
- (1997) Chem. Lett. , vol.26 , pp. 265
- Nakayama, T.¹ Haga, K.² Haba, O.³ Ueda, M.⁴

9
- 0001379665
- M. Ueda, D. Takahashi, T. Nakayama, and O. Haba: Chem. Mater. 10 (1998) 2230.
- (1998) Chem. Mater. , vol.10 , pp. 2230
- Ueda, M.¹ Takahashi, D.² Nakayama, T.³ Haba, O.⁴

10
- 0009454023
- N. Kihara, S. Saito, T. Ushirogouchi, and M. Nakase: J. Photopolym. Sci. Technol. 11 (1998) 553.
- (1998) J. Photopolym. Sci. Technol. , vol.11 , pp. 553
- Kihara, N.¹ Saito, S.² Ushirogouchi, T.³ Nakase, M.⁴

11
- 0342986805
- S. Uchino, J. Yamamoto, S. Migitaka, K. Kojima, M. Hashimoto, and H.Shiraishi: J. Vac. Sci. Technol. B 16 (1998) 3684.
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3684
- Uchino, S.¹ Yamamoto, J.² Migitaka, S.³ Kojima, K.⁴ Hashimoto, M.⁵ Shiraishi, H.⁶

12
- 0032025032
- A. P. G. Robinson, R. E. Palmer, T. Tada, T. Kanayama, M. T. Allen, and J. A. Preece: Appl. Phys. Lett. 72 (1998) 1302.
- (1998) Appl. Phys. Lett. , vol.72 , pp. 1302
- Robinson, A.P.G.¹ Palmer, R.E.² Tada, T.³ Kanayama, T.⁴ Allen, M.T.⁵ Preece, J.A.⁶

13
- 0034248790
- D. C. Tully, A. R. Trimble, and J. M. J. Frechet: Adv. Mater. 12 (2000) 1118.
- (2000) Adv. Mater. , vol.12 , pp. 1118
- Tully, D.C.¹ Trimble, A.R.² Frechet, J.M.J.³

14
- 0034764021
- T. Kadota, M. Yoshiiwa, H. Kageyama, F. Wakaya, K. Gamo, and Y. Shirota: Proc. SPIE 4345 (2001) 891.
- (2001) Proc. SPIE , vol.4345 , pp. 891
- Kadota, T.¹ Yoshiiwa, M.² Kageyama, H.³ Wakaya, F.⁴ Gamo, K.⁵ Shirota, Y.⁶

15
- 0035338177
- T. Nishikubo and A. Kameyama: J. Polym. Sci., Part A 39 (2001) 1481.
- (2001) J. Polym. Sci., Part A , vol.39 , pp. 1481
- Nishikubo, T.¹ Kameyama, A.²

16
- 0037027258
- J.-B. Kim, H.-J. Yun, and Y.-G. Kwon: Chem. Lett. 31 (2002) 1064.
- (2002) Chem. Lett. , vol.31 , pp. 1064
- Kim, J.-B.¹ Yun, H.-J.² Kwon, Y.-G.³

17
- 85047103865
- H. Iimori, Y. Shibasaki, M. Ueda, and H. Ishii: J. Photopolym. Sci. Technol. 16 (2003) 685.
- (2003) J. Photopolym. Sci. Technol. , vol.16 , pp. 685
- Iimori, H.¹ Shibasaki, Y.² Ueda, M.³ Ishii, H.⁴

18
- 31844440098
- T. Hirayama, D. Shiono, S. Matsumaru, T. Ogata, H. Hada, J. Onodera, T. Arai, T. Sakamizu, A. Yamaguchi, H. Shiraishi, H. Fukuda, and M. Ueda: Jpn. J. Appl. Phys. 44 (2005) 5484.
- (2005) Jpn. J. Appl. Phys. , vol.44 , pp. 5484
- Hirayama, T.¹ Shiono, D.² Matsumaru, S.³ Ogata, T.⁴ Hada, H.⁵ Onodera, J.⁶ Arai, T.⁷ Sakamizu, T.⁸ Yamaguchi, A.⁹ Shiraishi, H.¹⁰ Fukuda, H.¹¹ Ueda, M.¹²

19
- 24644484214
- S. W. Chang, D. Yang, J. Dai, N. Felix, D. Bratton, K. Tsuchiya, Y. J. Kwark, J. Bravo-Vasquez, C. K. Ober, H. B. Cao, and H. Deng: Proc. SPIE 5753 (2005) 1.
- (2005) Proc. SPIE , vol.5753 , pp. 1
- Chang, S.W.¹ Yang, D.² Dai, J.³ Felix, N.⁴ Bratton, D.⁵ Tsuchiya, K.⁶ Kwark, Y.J.⁷ Bravo-Vasquez, J.⁸ Ober, C.K.⁹ Cao, H.B.¹⁰ Deng, H.¹¹

20
- 33745587825
- D. Bratton, R. Ayothi, N. Felix, H. Cao, H. Deng, and C. Ober: Proc. SPIE 6153 (2006) 61531D.
- (2006) Proc. SPIE , vol.6153
- Bratton, D.¹ Ayothi, R.² Felix, N.³ Cao, H.⁴ Deng, H.⁵ Ober, C.⁶

21
- 33745659218
- D. Shiono, T. Hirayama, H. Hada, J. Onodera, T. Arai, T. Sakamizu, A. Yamaguchi, K. Kojima, H. Shiraishi, and H. Fukuda: Jpn. J. Appl. Phys. 45 (2006) 5435.
- (2006) Jpn. J. Appl. Phys. , vol.45 , pp. 5435
- Shiono, D.¹ Hirayama, T.² Hada, H.³ Onodera, J.⁴ Arai, T.⁵ Sakamizu, T.⁶ Yamaguchi, A.⁷ Kojima, K.⁸ Shiraishi, H.⁹ Fukuda, H.¹⁰

22
- 33748280238
- A. P. G. Robinson, H. M. Zaid, F. P. Gibbons, R. E. Palmer, M. Manickam, J. A. Preece, R. Brainard, T. Zampini, and K. O'Connell: Microelectron. Eng. 83 (2006) 1115.
- (2006) Microelectron. Eng. , vol.83 , pp. 1115
- Robinson, A.P.G.¹ Zaid, H.M.² Gibbons, F.P.³ Palmer, R.E.⁴ Manickam, M.⁵ Preece, J.A.⁶ Brainard, R.⁷ Zampini, T.⁸ O'connell, K.⁹

23
- 50149087853
- S. Tanaka and C. Ober: Proc. SPIE 6753 (2006) 67532B.
- (2006) Proc. SPIE , vol.6753
- Tanaka, S.¹ Ober, C.²

24
- 33747408719
- K. Kojima, T. Hattori, H. Fukuda, T. Hirayama, D. Shiono, H. Hada, and J. Onodera: J. Photopolym. Sci. Technol. 19 (2006) 373.
- (2006) J. Photopolym. Sci. Technol. , vol.19 , pp. 373
- Kojima, K.¹ Hattori, T.² Fukuda, H.³ Hirayama, T.⁴ Shiono, D.⁵ Hada, H.⁶ Onodera, J.⁷

25
- 33748269339
- H. Oizumi, F. Kumasaka, Y. Tanaka, T. Hirayama, D. Shiono, H. Hada, J. Onodera, A. Yamaguchi, and I. Nishiyama: Microelectron. Eng. 83 (2006) 1107.
- (2006) Microelectron. Eng. , vol.83 , pp. 1107
- Oizumi, H.¹ Kumasaka, F.² Tanaka, Y.³ Hirayama, T.⁴ Shiono, D.⁵ Hada, H.⁶ Onodera, J.⁷ Yamaguchi, A.⁸ Nishiyama, I.⁹

26
- 34247623598
- D. Shiono, H. Hada, T. Hirayama, J. Onodera, H. Oizumi, I. Nishiyama, K. Kojima, A. Yamaguchi, and H. Fukuda: Microelectron. Eng. 84 (2007) 1084.
- (2007) Microelectron. Eng. , vol.84 , pp. 1084
- Shiono, D.¹ Hada, H.² Hirayama, T.³ Onodera, J.⁴ Oizumi, H.⁵ Nishiyama, I.⁶ Kojima, K.⁷ Yamaguchi, A.⁸ Fukuda, H.⁹

27
- 34247622865
- H. Oizumi, F. Kumasaka, Y. Tanaka, T. Hirayama, D. Shiono, H. Hada, J. Onodera, A. Yamaguchi, and I. Nishiyama: Microelectron. Eng. 84 (2007) 1049.
- (2007) Microelectron. Eng. , vol.84 , pp. 1049
- Oizumi, H.¹ Kumasaka, F.² Tanaka, Y.³ Hirayama, T.⁴ Shiono, D.⁵ Hada, H.⁶ Onodera, J.⁷ Yamaguchi, A.⁸ Nishiyama, I.⁹

28
- 35148825102
- X. André, J. Lee, A. De Silva, N. Felix, C. Ober, H. Cao, H. Deng, H. Kudo, D. Watanabe, and T. Nishikubo: Proc. SPIE 6519 (2007) 65194B.
- (2007) Proc. SPIE , vol.6519
- André, X.¹ Lee, J.² De Silva, A.³ Felix, N.⁴ Ober, C.⁵ Cao, H.⁶ Deng, H.⁷ Kudo, H.⁸ Watanabe, D.⁹ Nishikubo, T.¹⁰

29
- 36148983500
- D. Shimizu, K. Maruyama, A. Saitou, T. Kai, T. Shimokawa, K. Fujiwara, Y. Kikuchi, and I. Nishiyama: J. Photopolym. Sci. Technol. 20 (2007) 423.
- (2007) J. Photopolym. Sci. Technol. , vol.20 , pp. 423
- Shimizu, D.¹ Maruyama, K.² Saitou, A.³ Kai, T.⁴ Shimokawa, T.⁵ Fujiwara, K.⁶ Kikuchi, Y.⁷ Nishiyama, I.⁸

30
- 57249103669
- H. Oizumi, T. Kumise, and T. Itani: J. Vac. Sci. Technol. B 26 (2008) 2252.
- (2008) J. Vac. Sci. Technol. B , vol.26 , pp. 2252
- Oizumi, H.¹ Kumise, T.² Itani, T.³

31
- 70249149712
- D. Shiono, H. Hada, T. Hirayama, J. Onodera, T. Watanabe, and H. Kinoshita: Jpn. J. Appl. Phys. 48 (2009) 06FC08.
- (2009) Jpn. J. Appl. Phys. , vol.48
- Shiono, D.¹ Hada, H.² Hirayama, T.³ Onodera, J.⁴ Watanabe, T.⁵ Kinoshita, H.⁶

32
- 57349173018
- H. Yamamoto, T. Kozawa, S. Tagawa, T. Ando, K. Ohmori, M. Sato, and J. Onodera: Proc. SPIE 6923 (2008) 69230N.
- (2008) Proc. SPIE , vol.6923
- Yamamoto, H.¹ Kozawa, T.² Tagawa, S.³ Ando, T.⁴ Ohmori, K.⁵ Sato, M.⁶ Onodera, J.⁷

33
- 47949114437
- F. P. Gibbons, A. P. G. Robinson, R. E. Palmer, S. Diegoli, M. Manickam, and J. A. Preece: Adv. Funct. Mater. 18 (2008) 1977.
- (2008) Adv. Funct. Mater. , vol.18 , pp. 1977
- Gibbons, F.P.¹ Robinson, A.P.G.² Palmer, R.E.³ Diegoli, S.⁴ Manickam, M.⁵ Preece, J.A.⁶

34
- 70349687387
- S. Hattori, A. Yamada, S. Saito, K. Asakawa, T. Koshiba, and T. Nakasugi: J. Vac. Sci. Technol. B 27 (2009) 2138.
- (2009) J. Vac. Sci. Technol. B , vol.27 , pp. 2138
- Hattori, S.¹ Yamada, A.² Saito, S.³ Asakawa, K.⁴ Koshiba, T.⁵ Nakasugi, T.⁶

35
- 0030475726
- M. Sawamura, H. Iikura, and E. Nakamura: J. Am. Chem. Soc. 118 (1996) 12850.
- (1996) J. Am. Chem. Soc. , vol.118 , pp. 12850
- Sawamura, M.¹ Iikura, H.² Nakamura, E.³

36
- 34250858855
- Y. Matsuo, K. Tahara, K. Morita, K. Matsuo, and E. Nakamura: Angew. Chem., Int. Ed. 46 (2007) 2844.
- (2007) Angew. Chem. Int. Ed. , vol.46 , pp. 2844
- Matsuo, Y.¹ Tahara, K.² Morita, K.³ Matsuo, K.⁴ Nakamura, E.⁵

37
- 67651235488
- Y. Matsuo, Y. Sato, M. Hashiguchi, K. Matsuo, and E. Nakamura: Adv. Funct. Mater. 19 (2009) 2224.
- (2009) Adv. Funct. Mater. , vol.19 , pp. 2224
- Matsuo, Y.¹ Sato, Y.² Hashiguchi, M.³ Matsuo, K.⁴ Nakamura, E.⁵

38
- 0027562057
- C. B. Eom, A. F. Hebard, L. E. Trimble, G. K. Celler, and R. C. Haddon: Science 259 (1993) 1887.
- (1993) Science , vol.259 , pp. 1887
- Eom, C.B.¹ Hebard, A.F.² Trimble, L.E.³ Celler, G.K.⁴ Haddon, R.C.⁵

39
- 0031070349
- T. Ishii, H. Nozawa, and T. Tamamura: Microelectron. Eng. 35 (1997) 113.
- (1997) Microelectron. Eng. , vol.35 , pp. 113
- Ishii, T.¹ Nozawa, H.² Tamamura, T.³

40
- 0034290683
- T. Ishii, T. Tamamura, and K. Shigehara: Jpn. J. Appl. Phys. 39 (2000) L1068.
- (2000) Jpn. J. Appl. Phys. , vol.39
- Ishii, T.¹ Tamamura, T.² Shigehara, K.³

41
- 0035329049
- T. Ishii, Y. Murata, and K. Shigehara: Jpn. J. Appl. Phys. 40 (2001) L478.
- (2001) Jpn. J. Appl. Phys. , vol.40
- Ishii, T.¹ Murata, Y.² Shigehara, K.³

42
- 55049119975
- K. Tawarayama, S. Magoshi, Y. Tanaka, S. Shirai, and H. Tanaka: Jpn. J. Appl. Phys. 47 (2008) 4866.
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 4866
- Tawarayama, K.¹ Magoshi, S.² Tanaka, Y.³ Shirai, S.⁴ Tanaka, H.⁵

43
- 45549102786
- Y. Tanaka, H. Aoyama, K. Tawarayama, S. Magoshi, S. Shirai, and H. Tanaka: Proc. SPIE 6921 (2008) 69211D.
- (2008) Proc. SPIE , vol.6921
- Tanaka, Y.¹ Aoyama, H.² Tawarayama, K.³ Magoshi, S.⁴ Shirai, S.⁵ Tanaka, H.⁶

44
- 57249094103
- T. Itani, K. Kaneyama, T. Kozawa, and S. Tagawa: J. Vac. Sci. Technol. B 26 (2008) 2261.
- (2008) J. Vac. Sci. Technol. B , vol.26 , pp. 2261
- Itani, T.¹ Kaneyama, K.² Kozawa, T.³ Tagawa, S.⁴

45
- 65849530152
- H. Oizumi, D. Kawamura, K. Kaneyama, S. Kobayashi, and T. Itani: Proc. SPIE 7273 (2009) 72731M.
- (2009) Proc. SPIE , vol.7273
- Oizumi, H.¹ Kawamura, D.² Kaneyama, K.³ Kobayashi, S.⁴ Itani, T.⁵

46
- 65849148619
- S. Kobayashi, J. J. Santillan, H. Oizumi, and T. Itani: Proc. SPIE 7273 (2009) 72731P.
- (2009) Proc. SPIE , vol.7273
- Kobayashi, S.¹ Santillan, J.J.² Oizumi, H.³ Itani, T.⁴

47
- 55049090601
- J. J. Santillan, S. Kobayashi, and T. Itani: Jpn. J. Appl. Phys. 47 (2008) 4922.
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 4922
- Santillan, J.J.¹ Kobayashi, S.² Itani, T.³

48
- 70249151096
- S. Kobayashi, J. J. Santillan, H. Oizumi, and T. Itani: Jpn. J. Appl. Phys. 48 (2009) 06FC02.
- (2009) Jpn. J. Appl. Phys. , vol.48
- Kobayashi, S.¹ Santillan, J.J.² Oizumi, H.³ Itani, T.⁴

49
- 4444350372
- Y. Yamamoto, A. Nakano, K. Okamoto, T. Kozawa, and S. Tagawa: Jpn. J. Appl. Phys. 43 (2004) 3971.
- (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 3971
- Yamamoto, Y.¹ Nakano, A.² Okamoto, K.³ Kozawa, T.⁴ Tagawa, S.⁵

50
- 33845240818
- T. Kozawa, S. Tagawa, H. Oizumi, and I. Nishiyama: J. Vac. Sci. Technol. B 24 (2006) L27.
- (2006) J. Vac. Sci. Technol. B , vol.24
- Kozawa, T.¹ Tagawa, S.² Oizumi, H.³ Nishiyama, I.⁴

51
- 0001998551
- S. G. Lias, J. E. Bartmess, J. F. Liebman, J. L. Holmes, R. D. Levin, and W. G. Mallard: J. Phys. Chem. Ref. Data 17 (1988) Suppl. 1, 1.
- (1988) J. Phys. Chem. Ref. Data , vol.17 , Issue.SUPPL. 1 , pp. 1
- Lias, S.G.¹ Bartmess, J.E.² Liebman, J.F.³ Holmes, J.L.⁴ Levin, R.D.⁵ Mallard, W.G.⁶

52
- 77955313244
- to be presented at, 26-29 March, Higashi Osaka
- K. Kawakami, K. Tanaka, H. Oizumi, and T. Itani: to be presented at 90th Spring Meeting, Chemical Society of Japan, 26-29 March, 2010, Higashi Osaka.
- (2010) 90th Spring Meeting, Chemical Society of Japan
- Kawakami, K.¹ Tanaka, K.² Oizumi, H.³ Itani, T.⁴

53
- 0033718294
- S. Nagahara, Y. Sakurai, M. Wakita, Y. Yamamoto, S. Tagawa, M. Komuro, E. Yano, and S. Okazaki: Proc. SPIE 3999 (2000) 386.
- (2000) Proc. SPIE , vol.3999 , pp. 386
- Nagahara, S.¹ Sakurai, Y.² Wakita, M.³ Yamamoto, Y.⁴ Tagawa, S.⁵ Komuro, M.⁶ Yano, E.⁷ Okazaki, S.⁸

54
- 0000843929
- S. Tagawa, S. Nagahara, T. Iwamoto, M. Wakita, T. Kozawa, Y. Yamamoto, D. Werst, and A. D. Trifunac: Proc. SPIE 3999 (2000) 204.
- (2000) Proc. SPIE , vol.3999 , pp. 204
- Tagawa, S.¹ Nagahara, S.² Iwamoto, T.³ Wakita, M.⁴ Kozawa, T.⁵ Yamamoto, Y.⁶ Werst, D.⁷ Trifunac, A.D.⁸

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