Outgassing quantification analysis of extreme ultraviolet resists

Japanese Journal of Applied Physics

Volumn 47, Issue 6 PART 2, 2008, Pages 4922-4925

  Santillan, Julius Joseph ^a   Kobayashi, Shinji ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV resist; Outgassing quantification; Poly(hydroxystyrene); Pressure rise method; Quadrupole mass spectrometry; Triethylamine

Indexed keywords

ACIDS; CONCENTRATION (PROCESS); HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; LASER PULSES; MASS SPECTROMETERS; MASS SPECTROMETRY; QUENCHING; SPECTROMETERS; SPECTROMETRY; SPECTRUM ANALYSIS; ULTRAVIOLET DEVICES;

EUV RESIST; OUTGASSING QUANTIFICATION; POLY(HYDROXYSTYRENE); PRESSURE RISE METHOD; QUADRUPOLE MASS SPECTROMETRY; TRIETHYLAMINE;

DEGASSING;

EID: 55049090601     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.4922     Document Type: Article

References (7)

1. D. Van Steenwinckel, R. Gronheid, and F. Van Roey: presented at 2007 Int. Symp. Extreme Ultraviolet Lithography, 2007.
2. G. Gallatin, P. Naulleau, R. Brainard, D. Niakoula, and K. Dean: presented at 2007 Int. Symp. Extreme Ultraviolet Lithography, 2007.
3. T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Hada, and Y. Ohkubo: presented at 2006 Int. Symp. Extreme Ultraviolet Lithography, 2006.
4. S. Uzawa, H. Kubo, and T. Tsuji: presented at 2006 Int. Symp. Extreme Ultraviolet Lithography, 2006.
5. H. Meiling, R. Groenveld, H. Meijer, H. J. Voorma, N. Harned, and J. Zimmerman: presented at 2006 Int. Symp. Extreme Ultraviolet Lithography, 2006.
6. K. Dean, I. Nishiyama, H. Oizumi, A. Keen, H. Cao, W. Yueh, T. Watanabe, P. Lacovig, L. Rumiz, G. Denbeaux, and J. Simon: Proc. SPIE 6519 (2007) 65191 P.
7. J. J. Santillan, M. Toriumi, and T. Itani: Proc. SPIE 6519 (2007) 651944.