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Volumn 48, Issue 6 PART 2, 2009, Pages
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Decomposition analysis of chemically amplified resists for improving critical dimension control
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICALLY AMPLIFIED RESIST;
CRITICAL DIMENSION CONTROL;
DECOMPOSITION ANALYSIS;
DECOMPOSITION REACTION;
DEPROTECTION;
DISSOLUTION RATES;
EXPOSURE DOSE;
FULLY PROTECTED;
HIGH PURITY;
LINE EDGE ROUGHNESS;
MAXIMUM SURFACE ROUGHNESS;
MOLECULAR RESISTS;
PROTECTING GROUP;
RESIST FILMS;
SIMPLE STRUCTURES;
UNEXPOSED REGIONS;
CHROMATOGRAPHIC ANALYSIS;
DISSOLUTION;
ELECTRON BEAM LITHOGRAPHY;
HIGH PERFORMANCE LIQUID CHROMATOGRAPHY;
HIGH PRESSURE LIQUID CHROMATOGRAPHY;
MATERIALS;
PHOTORESISTORS;
ROUGHNESS MEASUREMENT;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
PHOTORESISTS;
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EID: 70249149712
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.48.06FC08 Document Type: Article |
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Times cited : (8)
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References (11)
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