Effects of aberration and flare on lithographic performance of SFET

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Tanaka, Yuusuke ^a   Aoyama, Hajime ^a   Tawarayama, Kazuo ^a   Magoshi, Shunko ^a   Shirai, Seiichiro ^a   Tanaka, Hiroyuki ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Aberration; Annular; Astigmatic; EUVL; Flare; Focus; Image contrast; Kirk method; PSF; SFET

Indexed keywords

ANNULAR; ASTIGMATIC; FLARE; IMAGE CONTRASTS; KIRK METHOD; PSF; SFET;

OPTICAL TRANSFER FUNCTION;

EID: 45549102786     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771626     Document Type: Conference Paper

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