Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 27-30

  Kozawa, Takahiro ^a   Tagawa, Seiichi ^a   Oizumi, Hiroaki ^b   Nishiyama, Iwao ^b  

^a OSAKA UNIVERSITY   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; DYES; ELECTRON BEAMS; IONIZATION; MATHEMATICAL MODELS; MOLECULES; PHOTONS; ULTRAVIOLET RADIATION;

ACID GENERATION; CATALYTIC REACTIONS; CHEMICALLY AMPLIFIED RESISTS; ULTRAFINE PATTERNS;

INORGANIC ACIDS;

EID: 33845240818     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2393297     Document Type: Article

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