Extreme ultraviolet resist outgassing quantification verification by resist film analysis

Japanese Journal of Applied Physics

Volumn 48, Issue 6 PART 2, 2009, Pages

  Kobayashi, Shinji ^a   Santillan, Julius Joseph ^a   Oizumi, Hiroaki ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYSIS METHOD; DEPROTECTION REACTION; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; GAS CHROMATOGRAPHY-MASS SPECTROMETRY; OUTGASSING QUANTIFICATION; PHOTOACID GENERATORS; POSTEXPOSURE BAKE; PRESSURE RISE; RESIST FILMS;

CHROMATOGRAPHIC ANALYSIS; ELECTRIC EQUIPMENT PROTECTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS CHROMATOGRAPHY; MASS SPECTROMETRY; QUALITY ASSURANCE; RELIABILITY ANALYSIS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPY; ULTRAVIOLET DEVICES;

DEGASSING;

EID: 70249151096     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.06FC02     Document Type: Article

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