Highly sensitive positive-working molecular resist based on new molecule

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 5, 2009, Pages 2138-2144

  Hattori, Shigeki ^a   Yamada, Arisa ^a   Saito, Satoshi ^a   Asakawa, Koji ^a   Koshiba, Takeshi ^a   Nakasugi, Tetsuro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS TRANSITION TEMPERATURE; HIGH SENSITIVITY; HIGHLY SENSITIVE; LEAVING GROUPS; LINE-AND-SPACE; LOW ENERGY ELECTRON BEAMS; MOLECULAR RESISTS; POSITIVE TONE;

BENZENE; ELECTRON BEAMS;

GLASS TRANSITION;

EID: 70349687387     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3204984     Document Type: Article

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