A nano-composite resist system: A new approach to nanometer pattern fabrication

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 113-116

  Ishii, T ^a   Nozawa, H ^a   Tamamura, T ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ELECTRON BEAM LITHOGRAPHY; POLYMETHYL METHACRYLATES; SEMICONDUCTING POLYMERS; ULTRATHIN FILMS;

ETCHING RESISTANCE; NANOCOMPOSITE RESIST SYSTEM;

NANOTECHNOLOGY;

EID: 0031070349     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00167-0     Document Type: Article

References (3)

1. K. Kurihara, K. Iwadate, H. Namatsu, M. Nagase, and K. Murase, J. Vac. Sci. Technol., B13 (1995) 2170.
2. M. Kakuchi, M. Hikita, and T. Tamamura, Appl. Phys. Lett., 48 (1986) 835.
3. H. Ito, W. P. England, N. J. Clecak, G. Breyta, H. Lee, D. Y. Yoon, R. Sooriyakumaran, and W. D. Hinsberg, Proc. SPIE, 1259 (1993) 65.