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Volumn 39, Issue 10 B, 2000, Pages

Fullerene-derivative nanocomposite resist for nanometer pattern fabrication

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; FULLERENES; MOLECULAR STRUCTURE; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SOLUBILITY;

EID: 0034290683     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l1068     Document Type: Article
Times cited : (11)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.