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Volumn 39, Issue 10 B, 2000, Pages
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Fullerene-derivative nanocomposite resist for nanometer pattern fabrication
c
NTT CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
AGGLOMERATION;
DRY ETCHING;
ELECTRON BEAM LITHOGRAPHY;
FULLERENES;
MOLECULAR STRUCTURE;
NANOSTRUCTURED MATERIALS;
NANOTECHNOLOGY;
SOLUBILITY;
DRY ETCHING RESISTANCE;
MOLECULAR DESIGN;
NANOCOMPOSITE RESIST;
PHOTORESISTS;
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EID: 0034290683
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.l1068 Document Type: Article |
Times cited : (11)
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References (7)
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