SCOPUS 정보 검색 플랫폼

Volumn 47, Issue 6 PART 2, 2008, Pages 4866-4871

Extreme ultraviolet lithography using small-field exposure tool: Current status

Author keywords

EUVL; Extreme ultraviolet lithography; Resist printing

Indexed keywords

EXPOSURE METERS; LASER PULSES; LITHOGRAPHY; ULTRAVIOLET DEVICES;

CURRENT STATUSES; EUVL; EXTREME ULTRAVIOLETS; FIELD EXPOSURES; RESIST PRINTING; TOOL TECHNOLOGIES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 55049119975 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.4866 Document Type: Article

Times cited : (38)

References (8)

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