Contrast enhancement of ZEP520 resist by fullerene-derivative incorporation

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 5 A, 2001, Pages

  Ishii, Tetsuyoshi ^a   Murata, Yuka ^b   Shigehara, Kiyotaka ^b  

^a NTT CORPORATION   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Electron beam lithography; Fullerene (C60, C70); Nanocomposite; Resist

Indexed keywords

DERIVATIVES; ELECTRON BEAM LITHOGRAPHY; FULLERENES; LANGMUIR BLODGETT FILMS; MOLECULAR STRUCTURE; NANOTECHNOLOGY; ULTRATHIN FILMS;

CONTRAST ENHANCEMENT;

NANOSTRUCTURED MATERIALS;

EID: 0035329049     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l478     Document Type: Article

References (7)