Phenolic molecular glasses as resists for next generation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  André, Xavier ^a   Lee, Jin Kyun ^a   De Silva, Anuja ^a   Felix, Nelson ^a   Ober, Christopher K ^a   Cao, Heidi B ^b   Deng, Hai ^b   Kudo, Hiroto ^b   Watanabe, Daisuke ^c   Nishikubo, Tadatomi ^c  

^a Cornell University   (United States)

^b INTEL CORPORATION   (United States)

^c KANAGAWA UNIVERSITY   (Japan)

Author keywords

Chemical amplification; Electron beam; Extreme ultraviolet; Molecular glass resist

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MOLECULAR STRUCTURE; PHENOLS; PHOTORESISTS;

AROMATIC BACKBONES; EXTREME ULTRAVIOLET; LITHOGRAPHIC EVALUATION; MOLECULAR GLASS RESISTS;

GLASS TRANSITION;

ELECTRON BEAMS; GLASS; LITHOGRAPHY; MOLECULAR STRUCTURE; PHENOLS;

EID: 35148825102     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.722919     Document Type: Conference Paper

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