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Volumn 5753, Issue I, 2005, Pages 1-9

Materials for future lithography

Author keywords

dimethylbenzylphenol; 4 4 1,1 bis(4 hydroxyphenyl)ethyl ; Calix 4 resorcinarene; E beam lithography; EUV lithography; EUV resists

Indexed keywords

Α-DIMETHYLBENZYLIPHENOL; CALIX[4]RESORCINARENE; E-BEAM LITHOGRAPHY; ELEMENTAL COMPOSITION; EUV LITHOGRAPHY; EUV RESISTS;

EDGE DETECTION; GLASS; MOLECULAR DYNAMICS; ROUGHNESS MEASUREMENT; SILICON; STRATEGIC PLANNING;

PHOTOLITHOGRAPHY;

EID: 24644484214 PISSN: 16057422 EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.607235 Document Type: Conference Paper

Times cited : (33)

References (14)

1
- 24644497379
- W. Yeuh, H. B. Cao, M. Chandhok, S. Lee, M. Shumway, J. Bokor, Proc. SPIE, 2004, 5376, 434
- (2004) Proc. SPIE , vol.5376 , pp. 434
- Yeuh, W.¹ Cao, H.B.² Chandhok, M.³ Lee, S.⁴ Shumway, M.⁵ Bokor, J.⁶

2
- 3843071982
- H. B. Cao, W. Yeuh, B. J. Rice, J. Roberts, T. Bacuita, M. Chandhok, Proc. SPIE, 2004, 5376, 757
- (2004) Proc. SPIE , vol.5376 , pp. 757
- Cao, H.B.¹ Yeuh, W.² Rice, B.J.³ Roberts, J.⁴ Bacuita, T.⁵ Chandhok, M.⁶

3
- 3843125194
- J. Dai and C.K. Ober, Proc. SPIE, 2004, 5376, 508
- (2004) Proc. SPIE , vol.5376 , pp. 508
- Dai, J.¹ Ober, C.K.²

4
- 3843152662
- J. P. Bravo-Vasquez, Y.-J. Kwark, C. K. Ober, H. B. Cao, H. Deng, R. Meagley, Proc. SPIE, 2004, 5376, 739
- (2004) Proc. SPIE , vol.5376 , pp. 739
- Bravo-Vasquez, J.P.¹ Kwark, Y.-J.² Ober, C.K.³ Cao, H.B.⁴ Deng, H.⁵ Meagley, R.⁶

5
- 24644504474
- Ph.D. Dissertation, Cornell University
- J. Dai and C.K. Ober, Ph.D. Dissertation, Cornell University 2004
- (2004)
- Dai, J.¹ Ober, C.K.²

6
- 0034764021
- T. Kadota, M. Yoshiita, H. Kageyama, F. Wakaya, K. Gamo, Y. Shirota, Proc. SPIE, 2001, 4345, 891
- (2001) Proc. SPIE , vol.4345 , pp. 891
- Kadota, T.¹ Yoshiita, M.² Kageyama, H.³ Wakaya, F.⁴ Gamo, K.⁵ Shirota, Y.⁶

7
- 0034031562
- Y. Shirota, J. Mater. Chem. 2000, 10, 1
- (2000) J. Mater. Chem. , vol.10 , pp. 1
- Shirota, Y.¹

8
- 0000274144
- M. Yoshiiwa, H. Kageyama, Y. Shirota, F. Wakaya, K. Gamo, M. Takai, Appl. Phys. Lett. 1996, 69, 2605
- (1996) Appl. Phys. Lett. , vol.69 , pp. 2605
- Yoshiiwa, M.¹ Kageyama, H.² Shirota, Y.³ Wakaya, F.⁴ Gamo, K.⁵ Takai, M.⁶

9
- 0036029116
- A. Hamad, Y. C. Bae, X. -Q Liu, C. K. Ober, F. M. Houlihan, G. Dabbagh, A. E. Novembre, Proc. SPIE, 2002, 4690, 477
- (2002) Proc. SPIE , vol.4690 , pp. 477
- Hamad, A.¹ Bae, Y.C.² Liu, X.Q.³ Ober, C.K.⁴ Houlihan, F.M.⁵ Dabbagh, G.⁶ Novembre, A.E.⁷

10
- 0002460833
- Y.-G. Kwon, J. B. Kim, T. Fujigaya, Y. Shibasaki, M. Ueda, J. Mater. Chem. 2002, 12, 53
- (2002) J. Mater. Chem. , vol.12 , pp. 53
- Kwon, Y.-G.¹ Kim, J.B.² Fujigaya, T.³ Shibasaki, Y.⁴ Ueda, M.⁵

11
- 0001379665
- M. Ueda, D. Takahashi, T. Nakayama, O. Haba, Chem. Mater. 1998, 10, 2230
- (1998) Chem. Mater. , vol.10 , pp. 2230
- Ueda, M.¹ Takahashi, D.² Nakayama, T.³ Haba, O.⁴

12
- 0001512129
- J. Fujita, Y. Ohnishi, Y. Ochiai, S, Matsui, Appl. Phys. Lett. 1996, 68(9), 1297
- (1996) Appl. Phys. Lett. , vol.68 , Issue.9 , pp. 1297
- Fujita, J.¹ Ohnishi, Y.² Ochiai, Y.³ Matsui, S.⁴

13
- 0041475404
- F. Weiner, H.-J. Schneider, J. Org. Chem. 1991, 56, 5527
- (1991) J. Org. Chem. , vol.56 , pp. 5527
- Weiner, F.¹ Schneider, H.-J.²

14
- 0035519476
- J. Shin, G. Han, Y. Ma, K. Moloni, F. J. Cerrina, J. Vac. Sci. Technol. B, 2001, 19, 2890
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 2890
- Shin, J.¹ Han, G.² Ma, Y.³ Moloni, K.⁴ Cerrina, F.J.⁵

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