Pulsed magnetron sputtering - process overview and applications

Journal of Optoelectronics and Advanced Materials

Volumn 11, Issue 9, 2009, Pages 1101-1107

  Kelly, P J ^a   Bradley, J W ^b  

^a MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Plasma diagnostics; Pulsed magnetron sputtering; Thin films

Indexed keywords

ALUMINA; ALUMINUM OXIDE; COATINGS; ELECTRIC DISCHARGES; ELECTRON TEMPERATURE; PLASMA DIAGNOSTICS; SILICA; THIN FILMS; TITANIUM DIOXIDE; TITANIUM NITRIDE;

COMPETITIVE RATES; CONVENTIONAL COATINGS; DEFECT FREE COATINGS; DEPOSITION CONDITIONS; LONG TERM PROCESS; MAGNETRON DISCHARGES; PULSED MAGNETRON SPUTTERING; TRIBOLOGICAL PROPERTIES;

MAGNETRON SPUTTERING;

EID: 76149144779     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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