Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 967-971

  Gloss D ^a   Frach, Peter ^a   Zywitzki, O ^a   Modes, T ^a   Klinkenberg, S ^a   Gottfried, C ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Low temperature deposition; Photocatalysis; Pulse magnetron sputtering; Reactive sputtering; Titanium dioxide

Indexed keywords

AMORPHOUS FILMS; ANNEALING; DEPOSITION; HYDROPHILICITY; LOW TEMPERATURE PROPERTIES; MAGNETRON SPUTTERING; PHOTOCATALYSIS; THIN FILMS;

LOW TEMPERATURE DEPOSITION; PULSE MAGNETRON SPUTTERING; REACTIVE SPUTTERING;

TITANIUM DIOXIDE;

PLASMA TREATMENT;

EID: 24644486011     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.018     Document Type: Article

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