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Journal of Physics D: Applied Physics

Volumn 34, Issue 18, 2001, Pages 2709-2714

Using Langmuir probes to measure the plasma decay rates in pulsed RF magnetron discharges

(4) Backer H a Bradley, J W a Kelly, P J b Arnell, R D b

a UNIVERSITY OF MANCHESTER (United Kingdom)

b UNIVERSITY OF SALFORD (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; MAGNETRONS; PLASMA DENSITY; PLASMA PROBES; THIN FILMS;

PLASMA DECAY RATES;

PLASMA SHEATHS;

EID: 0035929071 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/34/18/301 Document Type: Article

Times cited : (25)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.