Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 42-47

  Vergohl M ^a   Malkomes, N ^a   Staedler, T ^a   Matthee T ^a   Richter, U ^b  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b SENTECH INSTRUMENTS GMBH   (Germany)

Author keywords

Ellipsometry; Optical coatings; Silicon oxide; Titanium oxide

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; GLASS; ION BOMBARDMENT; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; MORPHOLOGY; PLASMA HEATING; PROCESS CONTROL; REFRACTIVE INDEX; SILICON COMPOUNDS; TITANIUM OXIDES;

ANGLES OF INCIDENCE; EX-SITU ELLIPSOMETRY; FLOATGLASS SUBSTRATES; LORENTZ MODEL;

ANTIREFLECTION COATINGS;

EID: 0037492291     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00152-2     Document Type: Article

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