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Volumn 174-175, Issue , 2003, Pages 88-93
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Mid-frequency reactive sputtering of dielectrics: Al2O3
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Author keywords
Biasing; Dielectrics; Reactive sputtering
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Indexed keywords
ALUMINA;
DIELECTRIC MATERIALS;
FREQUENCIES;
SUBSTRATES;
DUAL-MAGNETRON SYSTEM (DMS);
SPUTTERING;
COATING;
INDUSTRIAL APPLICATION;
PLASMA;
SURFACE PROPERTY;
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EID: 18544411652
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(03)00369-4 Document Type: Article |
Times cited : (17)
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References (32)
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