State of the art in large area vacuum coatings on glass

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 8-14

  Suzuki, K ^a  

^a Fujishiro Bld 3F   (Japan)

Author keywords

Glass; Indium tin oxide; Optical coating; Physical vapor deposition

Indexed keywords

COST BENEFIT ANALYSIS; GLASS; INDIUM COMPOUNDS; INDUSTRIAL ECONOMICS; MAGNETRON SPUTTERING; MARKETING; OPTICAL COATINGS; OXIDES; PLASMA APPLICATIONS; PRODUCTIVITY; VAPOR DEPOSITION;

DUAL PULSED MAGNETRON SPUTTERING; HIGH DENSITY PLASMA ASSISTED DEPOSITION; INDIUM TIN OXIDE; LARGE AREA VACUUM COATINGS; LOW VOLTAGE SPUTTERING; PHYSICAL VAPOR DEPOSITION;

VACUUM DEPOSITED COATINGS;

EID: 0033170239     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00148-0     Document Type: Article

References (21)

1. Fraunhofer Institute, Annual Report, Electron Beam and Plasma Technology, 1997, Dresden, Germany.
2. S. Schiller, K. Goedicke, V. Kirchhoff, T. Kopte, Society Vacuum Coalers, 38th Annual Conference Proceedings, p. 293
3. G. Brauer, J. Szczyrbowski, G. Teschner, Surf. Coat. Technol. 94-95 (1997) 658.
4. J. Szczyrbowski, G. Brauer, G. Teschner, A. Zmelty, Surf. Coat. Technol. 98 (1998) 1460.
5. T. Oyama, H. Ohsaki, Y. Ogata, S. Watanabe, J. Shimizu, Proc. 3rd ISSP, Tokyo, 1995.
6. Technical Report, BOC Coating Technology, Fairfield, CA, 1998.
7. R.J. Hill, F. Jansen, J. Non-Cryst. Solids 218 (1997) 35.
8. S. Ishibashi, Y. Higuchi, Y. Ota, K. Nakamura, J. Vac. Sci. Technol. A8 (1990) 1403.
9. J. Uramoto, Shinku 25 (1982) 66.
10. S. Takaki, Y. Shigesato, H. Harada, H. Kojima, T. Oyama, T. Haranou, SID Dig. Tech. Papers, 1990, p. 76
11. T. Oyama, N. Hashimoto, J. Shimizu, Y. Akao, H. Kojima, K. Aikawa, K. Suzuki, J. Vac. Sci. Technol. A10 (1992) 1682.
12. K. Suzuki, N. Hashimoto, T. Oyama, J. Shimizu, Y. Akao, H. Kojima, Thin Solid Films 226 (1993) 104.
13. M. Miyazaki, K. Sato, A. Mitui, H. Nishimura, J. Non-Cryst. Solids 218 (1997) 323.
14. E. Ando, J. Ebisawa, Y. Hayashi, A. Mitui, S. Suzuki, J. Non-Cryst. Solids 178 (1994) 238.
15. P.J. Lingle, R. Nalepka, US Patent 5,242,560.
16. Y. Tachibana, H. Ohsaki, T. Oyama, Proc. 6th Int. Conf. on New Glass, Oct. 1997, Tokyo.
17. S. Schiller, Proc. 1st Int. Pulsed Plasma Surface Technologies Workshop, April '98, San Diego, CA.
18. D.G. Teer, UK Patent no GB 2 258 343B, 1990.
19. R.P. Howson, Proc. Int. Conf. on Metallurgical Coatings and Thin Films, San Diego, CA, 1998.
20. S. Schiller, V. Kirchhoff, N. Schiller, M. Neumann, H. Morgner, S. Mutialu, Technology Update, Fraunhofer Institute Electron Beam and Plasma Technology, June 1998.
21. INM Institut fur Neue Materialien, Annual Report 1996 and 1997, Saarbrucken, Germany.