Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2 thin films

Plasma Sources Science and Technology

Volumn 15, Issue 2, 2006, Pages

  Belkind, A ^a   Zhu, W ^a,b   Lopez, J ^a,c   Becker, K ^a  

^a Stevens Institute of Technology   (United States)

^b OLD DOMINION UNIVERSITY   (United States)

^c SAINT PETER'S UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRON ENERGY LEVELS; LIGHT EMISSION; MAGNETRON SPUTTERING; THIN FILMS; TITANIUM DIOXIDE;

CONDUCTION CURRENT; EXPONENTIAL DECAYS; MAGNETRON PLASMA; TEMPORAL BEHAVIOR;

EMISSION SPECTROSCOPY;

EID: 33646425584     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/2/S03     Document Type: Conference Paper

References (32)

1. Pulker H K 1996 Coatings on Glass 4th edn (Amsterdam: Elsevier) p 359
2. Paz Y, Luo Z, Rabenberg L and Heller A 1995 J. Mater. Res. 10 2842
3. Selhofer H and Muller R 1999 Thin Solid Films 351 180
4. Shimizu K, Imai H, Hirashima H and Tsukuma K 1999 Thin Solid Films 351 220
5. Mardare D, Baban C, Gavrila R, Modreanu M and Rusu G I 2002 Surf. Sci. 507-510 468
6. Lu J P, Wang J and Raj R 1991 Thin Solid Films 204 113
7. Vorotilov K A, Drlova E V and Petrovsky V I 1992 Thin Solid Films 207 180
8. Martin N, Rousselot C, Savall C and Palmino F 1996 Thin Solid Films 287 154
9. Vancoppenolle V, Jouan P-Y, Wautelet M, Dauchot J-P and Hecq M 1999 Surf. Coat. Technol. 116-119 933
10. Li S, Lee Y K, Sun C Q and Liang M H 2001 Surf. Rev. Lett. 8 465
11. Yang T H, Chi K S and Chen L J 2005 J. Appl. Phys. 98 034302
12. Schneider J M and Sproul W D 1998 Reactive pulsed dc magnetron sputtering and control Handbook of Thin Film Process Technology ed D Glocker (Bristol and Philadelphia: Isoflux Inc.) p A5.2: 1
13. Barocha P, Musila J, Vlceka J, Namc K H and Han J G 2005 Surf. Coat. Technol. 193 107
14. Henderson P S, Kelly P J, Arnell R D, Backer H and Bradley J W 2003 Surf. Coat. Technol. 174-175 779
15. Miyagi T, Kamei M, Ogawa T, Mitsuhashi T, Yamazaki A and Sato T 2003 Thin Solid Films 442 32
16. Bradley J W, Bäcker H, Kelly P J and Arnell R D 2001 Surf. Coat. Technol. 135 221
17. Bradley J W, Bäcker H, Kelly P J and Arnell R D 2001 Surf. Coat. Technol. 142-144 137
18. Belkind A, Zhao Z, Carter D, McDonough G, Roche G and Scholl R 2001 Time-resolved investigation of pulsed dc magnetron plasma Int. Conf. on Metallurgical Coatings and Thin Films (ICMCTF) (San Diego, CA, USA)
19. Bäcker H, Henderson P S, Bradley J W and Kelly P J 2003 Surf. Coat. Technol. 174-175 909
20. Bradley J W, Karkari S K and Vetushka A 2004 Plasma Sources Sci. Technol. 13 189
21. Miina M, Bradley J W, Bäcker H, Aranda-Gonzalvo Y, Karkari S K and Forder D 2002 Vacuum 68 171
22. Cornett M, George M, Walde H, Casson L and Pini R 2002 SVC 45th Annual Technical Conf. Proc. (Lake Buena Vista, FL, USA) pp 335-40
23. Pajdarov A D, Vlek J, Blshy P and Musil J 2003 ICPIG 26th Proc. (Greifswald, Germany) vol 1 pp 139-40
24. Lopez J, Zhu W, Freilich A, Belkind A and Becker K 2005 J. Phys. D: Appl. Phys. 38 1769
25. Belkind A, Freilich A, Lopez J, Zhao Z, Zhu W and Becker K 2005 New J. Phys. 7 90
26. Walkup R E 1986 J. Chem. Phys. 84 2668
27. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) p 257
28. Griem H R 1997 Principles of Plasma Spectroscopy (Cambridge: Cambridge University Press)
29. Becker K, Schmidt M, Viggiano A A, Dressler R and Williams S 2005 Non-Equilibrium Air Plasmas at Atmospheric Pressure ed K Becker et al (Bristol: Institute of Physics Publishers) pp 124-82
30. Cosby P C 1993 J. Chem. Phys. 98 9560
31. Lin C C 2004 Contrib. Plasma Phys. 44 405
32. Seo S-H, In J-H and Chang H-Y 2005 Plasma Sources Sci. Technol. 14 576-80