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Volumn 17, Issue 3, 1999, Pages 945-953

Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputtering

Author keywords

[No Author keywords available]

Indexed keywords


EID: 2142852262     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581669     Document Type: Article
Times cited : (96)

References (26)
  • 6
    • 0003890174 scopus 로고
    • Reactive Sputtering, edited by M. H. Francombe and J. L. Vossen Academic, New York
    • W. D. Westwood, in Reactive Sputtering, Physics of Thin Films Vol. 14, edited by M. H. Francombe and J. L. Vossen (Academic, New York, 1989).
    • (1989) Physics of Thin Films , vol.14
    • Westwood, W.D.1
  • 7
    • 0003494876 scopus 로고
    • Glow Discharge Plasmas and Sources for Etching and Deposition, edited by J. L. Vossen and W. Kern Academic, San Diego
    • S. M. Rossnagel, in Glow Discharge Plasmas and Sources for Etching and Deposition, Thin Film Processes II, edited by J. L. Vossen and W. Kern (Academic, San Diego, 1991).
    • (1991) Thin Film Processes II
    • Rossnagel, S.M.1
  • 13
    • 85034541913 scopus 로고    scopus 로고
    • UK Patent GB 2 258 343 B (1991)
    • D. G. Teer, UK Patent GB 2 258 343 B (1991).
    • Teer, D.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.