Properties of SnO2 films prepared by DC and MF reactive sputtering

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 146-150

  Ruske, M ^a   Brauer G ^a   Pistner, J ^a   Pfafflin U ^a   Szczyrbowski, J ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

Optical coatings; Sputtering; Tin oxide

Indexed keywords

COATING TECHNIQUES; DENSITY (SPECIFIC GRAVITY); FILM PREPARATION; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROHARDNESS; MORPHOLOGY; OXIDES; REFRACTIVE INDEX; RESIDUAL STRESSES;

DIRECT CURRENT REACTIVE SPUTTERING; MEDIUM FREQUENCY REACTIVE SPUTTERING; TIN OXIDE;

OPTICAL COATINGS;

EID: 0342903297     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00083-8     Document Type: Article

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