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Volumn 135, Issue 2-3, 2001, Pages 221-228

Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; COOLING; PLASMAS; SUBSTRATES; VOLTAGE MEASUREMENT;

EID: 0342468746     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00990-7     Document Type: Article
Times cited : (128)

References (29)
  • 6
    • 85031527404 scopus 로고    scopus 로고
    • Method for coating a substrate, US Patent 4 046 659, issued Sept 6, 1977 and assigned to Airco Corps., Berkeley CA, USA
    • R.L. Cormia, T.A. Trumbly, S. Andresen, Method for coating a substrate, US Patent 4 046 659, issued Sept 6, 1977 and assigned to Airco Corps., Berkeley CA, USA.
    • Cormia, R.L.1    Trumbly, T.A.2    Andresen, S.3
  • 10
    • 85031525145 scopus 로고    scopus 로고
    • Deposition behaviour and film characteristics of aluminum oxide deposited using high frequency pulsed-DC magnetron reactive sputtering
    • Seattle, Washington. 25-29 Oct.
    • D.C. Carter, G.W. McDonough, L.J. Mahoney, G.A. Roche H.V. Walde, Deposition behaviour and film characteristics of aluminum oxide deposited using high frequency pulsed-DC magnetron reactive sputtering. Presentation made at AVS 46th Int. Symp, Seattle, Washington. 25-29 Oct. 1999.
    • (1999) AVS 46th Int. Symp
    • Carter, D.C.1    McDonough, G.W.2    Mahoney, L.J.3    Roche, G.A.4    Walde, H.V.5
  • 11
    • 85031522195 scopus 로고    scopus 로고
    • Characterization studies of reactively pulsed magnetron sputtered alumina films
    • Seattle, Washington. 25-29 Oct.
    • P.J. Kelly, P.S. Henderson, R.D. Arnell, G.A. Roche and D. Carter, Characterization studies of reactively pulsed magnetron sputtered alumina films. Presentation made at AVS 46th Int. Symp, Seattle, Washington. 25-29 Oct. 1999.
    • (1999) AVS 46th Int. Symp
    • Kelly, P.J.1    Henderson, P.S.2    Arnell, R.D.3    Roche, G.A.4    Carter, D.5
  • 17
    • 0343926512 scopus 로고    scopus 로고
    • Substrate and plasma heating within high frequency bi-polar pulsed magnetron sputtering applications
    • Seattle, Washington, 25-29 Oct.
    • L.J. Mahoney, G.W. McDonough, D.C. Carter, G.A. Roche, H.V. Walde, Substrate and plasma heating within high frequency bi-polar pulsed magnetron sputtering applications. Presentation made at AVS 46th Int. Symp., Seattle, Washington, 25-29 Oct. 1999.
    • (1999) AVS 46th Int. Symp.
    • Mahoney, L.J.1    McDonough, G.W.2    Carter, D.C.3    Roche, G.A.4    Walde, H.V.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.