The effects of pulse frequency and substrate bias to the mechanical properties of CrN coatings deposited by pulsed DC magnetron sputtering

Thin Solid Films

Volumn 494, Issue 1-2, 2006, Pages 161-167

  Lee, Jyh Wei ^a   Tien, Shih Kang ^b   Kuo, Yu Chu ^a  

^a TUNG NAN INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Adhesion strength quality; CrN; Nanoindentation; Pulsed DC magnetron sputtering; Scratch test

Indexed keywords

ADHESION; CHROMIUM COMPOUNDS; GRAIN SIZE AND SHAPE; INDENTATION; MAGNETRON SPUTTERING; NATURAL FREQUENCIES; SPUTTER DEPOSITION; SUBSTRATES;

ADHESION STRENGTH QUALITY; CRN; NANOINDENTATION; PULSED DC MAGNETRON SPUTTERING; SCRATCH TEST;

COATINGS;

EID: 27844527045     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.190     Document Type: Conference Paper

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