The industrial application of pulsed DC bias power supplies in closed field unbalanced magnetron sputter ion plating

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 789-794

  Cooke, K E ^a   Hamsphire, J ^a   Southall, W ^a   Teer, D G ^a  

^a TEER COATINGS LTD   (United Kingdom)

Author keywords

C Magnetron; C Pulsed; C Sputtering

Indexed keywords

COATINGS; ELECTRIC POWER SYSTEMS; ION IMPLANTATION; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; PRESSURE EFFECTS; SPUTTER DEPOSITION; SURFACE CLEANING; THERMAL EFFECTS; VOLTAGE MEASUREMENT;

DIELECTRIC COATINGS; ION PLATING; PULSED DC POWER SUPPLIES;

DC POWER TRANSMISSION;

INDUSTRIAL APPLICATION;

EID: 1342289326     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.06.009     Document Type: Article

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