Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetron

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages

  Karkari, S K ^a   Vetushka, A ^a   Bradley, J W ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON EMISSION; EQUIVALENT CIRCUITS; ION BOMBARDMENT; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; PLASMA PROBES;

BIPOLAR PULSED MAGNETRON; EMISSIVE PROBE; PLASMA POTENTIAL;

PLASMA APPLICATIONS;

EID: 0842279602     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1622673     Document Type: Letter

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