The structure and properties of copper oxide and copper aluminium oxide coatings prepared by pulsed magnetron sputtering of powder targets

Vacuum

Volumn 79, Issue 3-4, 2005, Pages 221-230

  Alkoy, E M ^a,b   Kelly, P J ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b KOCAELI UNIVERSITY   (Turkey)

Author keywords

Copper aluminium oxide coatings; Copper oxide coatings; p type semiconductors; Powder targets; Pulsed magnetron sputtering

Indexed keywords

COPPER OXIDES; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PARTIAL PRESSURE; SEMICONDUCTOR MATERIALS; SPECTROPHOTOMETRY; X RAY DIFFRACTION ANALYSIS;

COPPER ALUMINUM OXIDE COATINGS; COPPER-OXIDE COATINGS; P-TYPE SEMICONDUCTORS; POWDER TARGETS; PULSED MAGNETRON SPUTTERING;

COATINGS;

EID: 22544485395     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.03.011     Document Type: Article

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