Particle-in-cell/monte carlo collisions treatment of an Ar/O2 magnetron discharge used for the reactive sputter deposition of TiOx films

New Journal of Physics

Volumn 11, Issue , 2009, Pages

  Bultinck, E ^a   Bogaerts, A ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; GAS RATIO; MAGNETRON DISCHARGES; PHYSICAL PROCESS; PLASMA POTENTIAL; PLASMA SPECIES; REACTIVE SPUTTER DEPOSITION; SECONDARY ELECTRON EMISSIONS; SPECIES DENSITY; SURFACE MODELS; TARGET SPUTTERING; TI ATOMS; TIO;

ARGON; ATOMS; IONS; MAGNETRONS; PLASMAS; SECONDARY EMISSION; STOICHIOMETRY; TARGETS;

ELECTRIC DISCHARGES;

EID: 70849133103     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/11/10/103010     Document Type: Article

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