SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 192, Issue 1-4, 2002, Pages 258-269

Modeling of magnetron sputtering plasmas

(2) Shon, C H a Lee, J K a

a Pohang University of Science and Technology (POSTECH) (South Korea)

Author keywords

Kinetic simulation; Low temperature plasmas; Magnetron sputter; Monte Carlo; Particle in cell

Indexed keywords

COMPUTER SIMULATION; ELECTRONS; EROSION; HIGH ENERGY PHYSICS; IONS; KINETIC THEORY; LOW TEMPERATURE EFFECTS; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; MONTE CARLO METHODS; PLASMA THEORY;

LOW-TEMPERATURE PLASMAS; VELOCITY DISTRIBUTION FUNCTIONS;

SURFACE TREATMENT;

EID: 0037198340 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)00030-2 Document Type: Conference Paper

Times cited : (86)

References (48)

1
- 0003494870
- Academic Press, New York
- (1974) Thin Film Processes , pp. 76
- Thornton, J.A.¹ Penfold, A.S.²

2
- 84953676480
- (1998) J. Vac. Sci. Technol. A , vol.6 , pp. 2960
- Gu, L.¹ Lieberman, M.A.²

3
- 0028481265
- (1994) IEEE Trans. Plasma Sci. , vol.22 , pp. 442
- Kuwahara, K.¹ Fujiyama, H.²

4
- 0005660138
- (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 4922
- Kuwahara, K.¹ Fujiyama, H.²

5
- 84956037963
- (1998) J. Vac. Sci. Technol. A , vol.6 , pp. 1827
- Wendt, A.E.¹ Lieberman, M.A.² Meuth, H.³

6
- 70649103994
- (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 902
- Wendt, A.E.¹ Lieberman, M.A.²

7
- 0030283777
- (1996) Jpn. J. Appl. Phys. , vol.35 , pp. 5858
- Choi, Y.W.¹ Bowden, M.² Muraoka, K.³

8
- 0001497345
- (1998) Surf. Coat. Technol. , vol.98 , pp. 1467
- Fujiyama, H.¹ Tokitu, Y.² Uchikawa, Y.³ Kuwahara, K.⁴ Miyake, K.⁵ Kuwahara, K.⁶ Doi, A.⁷

9
- 0030169933
- (1996) Vacuum , vol.47 , pp. 1013
- Nanbu, K.¹ Kondo, S.²

10
- 0031177528
- (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 4808
- Nanbu, K.¹ Kondo, S.²

11
- 84957231755
- (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 30
- Sheridan, T.E.¹ Goeckner, M.J.² Goree, J.³

12
- 84955031986
- (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 1623
- Sheridan, T.E.¹ Goeckner, M.J.² Goree, J.³

13
- 0026140816
- (1991) IEEE Trans. Plasma Sci. , vol.19 , pp. 301
- Goeckner, M.J.¹ Goree, J.² Sheridan, T.E.³

14
- 0030282578
- (1996) Plasma Sources Sci. Technol. , vol.5 , pp. 607
- Trennpohl W., Jr.¹ Bretagne, J.² Gousset, G.³ Pagnon, D.⁴ Touzeau, M.⁵

15
- 0001130943
- (1991) Appl. Phys. Lett. , vol.59 , pp. 1052
- Goree, J.¹ Sheridan, T.E.²

16
- 0033157441
- (1999) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 4440
- Shon, C.H.¹ Park, J.S.² Kang, B.K.³ Lee, J.K.⁴

17
- 0034817583
- (2001) Vacuum , vol.60 , pp. 299
- Shidoji, E.¹ Ness, K.² Makabe, T.³

18
- 0005681024
- (2001) Plasma Sources Sci. Technol. , vol.8 , pp. 1
- Shidoji, E.¹ Ando, E.² Makabe, T.³

19
- 0001012331
- (1999) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 2131
- Shidoji, E.¹ Ohtake, H.² Nakano, N.³ Makabe, T.⁴

20
- 0035859507
- (2001) J. Phys. D , vol.34 , pp. 2205
- White, R.D.¹ Robson, R.E.² Ness, K.F.³

21
- 0030490409
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 3108
- Serikov, V.V.¹ Nanbu, K.²

22
- 0033157624
- (1999) Jpn. J. Appl. Phys. , vol.38 , pp. 4450
- Ido, S.¹ Kashiwagi, M.² Takahashi, M.³

23
- 0028463374
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 4281
- Shidoji, E.¹ Nemoto, M.² Nomura, T.³ Yoshikawa, Y.⁴

24
- 0005755660
- Tokyo, June
- (1995) Proceedings of the Third International Symposium on Sputtering and Plasma Processes , pp. 23
- Kobayashi, T.¹ Itagaki, K.² Uchiyama, T.³ Tsukada, T.⁴ Hosokawa, N.⁵

25
- 0021463417
- (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 1285
- Somekh, R.E.¹

26
- 0001604677
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 189
- Motohiro, T.¹

27
- 0000074119
- (1992) J. Vac. Sci. Technol. A , vol.10 , pp. 455
- Turner, G.M.¹ Falconer, I.S.² James, B.W.³ Mckenzie, D.R.⁴

28
- 21144465503
- (1993) J. Vac. Sci. Technol. A , vol.11 , pp. 676
- Urbassek, H.M.¹ Sibold, D.²

29
- 84957230217
- (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 101
- Yamamura, Y.¹ Ishida, M.²

30
- 3342996734
- (1998) J. Appl. Phys. , vol.84 , pp. 564
- Nathan, S.S.¹ Rao, G.M.² Mohan, S.³

31
- 21844496176
- (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 2161
- Turner, G.M.¹

32
- 0000189257
- (2000) J. Appl. Phys. , vol.87 , pp. 8334
- Bogaerts, A.¹ Gijbels, R.² Serikov, V.V.³

33
- 0033204521
- (1999) IEEE Trans. Plasma Sci. , vol.27 , pp. 1389
- Serikov, V.V.¹ Kawamoto, S.² Nanbu, K.³

34
- 0005743161
- (1997) Surf. Coat. Technol. , vol.93 , pp. 1
- Kulka, R.¹

35
- 0031235125
- (1996) J. Phys. D , vol.30 , pp. 2573
- Cramer, N.F.¹

36
- 0031270788
- (1997) Plasma Sources Sci. Technol. , vol.6 , pp. 524
- Bradley, J.W.¹ Lister, G.²

37
- 0003730831
- Wiley, New York
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

38
- 0000781665
- (1998) IEEE Trans. Plasma Sci. , vol.26 , pp. 1635
- Shon, C.H.¹ Lee, J.K.² Lee, H.J.³ Shin, Y.K.⁴ Yang, Y.⁵ Chung, T.H.⁶

39
- 0000884445
- (1989) J. Vac. Sci. Technol. A , vol.7 , pp. 1014
- Sheridan, T.E.¹ Goree, J.²

40
- 0020114068
- (1983) J. Vac. Sci. Technol. A , vol.1 , pp. 426
- Rossnagel, S.M.¹ Robinson, R.S.²

41
- 0000946803
- (1999) J. Appl. Phys. , vol.86 , pp. 2984
- Okazawa, K.¹ Shidoji, E.² Makabe, T.³

42
- 0000807120
- (1985) J. Vac. Sci. Technol. A , vol.3 , pp. 561
- Hoffman, D.W.¹

43
- 84950555774
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 19
- Rossnagel, S.M.¹

44
- 84924717407
- (1991) J. Vac. Sci. Technol. A , vol.9 , pp. 688
- Sheridan, T.E.¹ Goeckner, M.J.² Goree, J.³

45
- 0032340164
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 2173
- Sheridan, T.E.¹ Goeckner, M.J.² Goree, J.³

46
- 0001038540
- (1993) Plasma Sources Sci. Technol. , vol.2 , pp. 127
- Guimaraes, F.¹ Bretagne, J.²

47
- 84957275571
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 1822
- Rossnagel, S.M.¹ Kaufman, H.R.²

48
- 0003400638
- Wiley, New York
- (1980) Glow Discharge Processes
- Chapman, B.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.