Influence of the target composition on the discharge voltage during magnetron sputtering

Surface and Coatings Technology

Volumn 201, Issue 3-4, 2006, Pages 848-854

  Depla, D ^a   Tomaszewski, H ^b   Buyle, G ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

^b Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

Author keywords

Discharge voltage; Magnetron sputtering; Reactive sputtering

Indexed keywords

ALUMINUM; COPPER; ELECTRIC DISCHARGES; TITANIUM DIOXIDE; VOLTAGE MEASUREMENT; YTTRIUM; ZIRCONIUM;

DISCHARGE VOLTAGE; ION INDUCED ELECTRON EMISSION (ISEE); TARGET COMPOSITION;

MAGNETRON SPUTTERING;

ALUMINUM; COPPER; ELECTRIC DISCHARGES; MAGNETRON SPUTTERING; TITANIUM DIOXIDE; VOLTAGE MEASUREMENT; YTTRIUM; ZIRCONIUM;

EID: 33748431641     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.12.047     Document Type: Article

References (18)

1. D. Depla, G. Buyle, J. Haemers, R. De Gryse, Accepted for publication in Surf. Coat. Technol. (in press).
2. Thornton J.A. J. Vac. Sci. Technol. 15 (1978) 171
3. Shidoji E., Ness K., and Makabe T. Vacuum 60 (2001) 299
4. Kondo S., and Nanbu K. J. Phys. D : Appl. Phys. 32 (1999) 1142
5. D. Depla, J. Haemers, R. De Gryse, Submitted for publication in Plasma Sources Science and Technology.
6. Pflug A., Szyszka B., Sittinger V., and Niemann J. Proceedings of 46th Annual SVC Technical Conference, Society of Vacuum Coaters, San Francisco, CA (2003) 241
7. Pekker L. Thin Solid Films 312 (1998) 341
8. Depla D., and De Gryse R. J. Vac. Sci. Technol., A 20 (2002) 521
9. Poelman H., Tomaszewski H., Poelman D., Depla D., and De Gryse R. Surf. Interface Anal. 36 (2004) 1167
10. Depla D., and De Gryse R. Plasma Sources Sci. Technol. 10 (2001) 547
11. Depla D., Colpaert A., Eufinger K., Segers A., Haemers J., and De Gryse R. Vacuum 66 (2002) 9
12. Westwood W.D., Maniv S., and Scanlon P.J. J. Appl. Phys. 54 (1983) 6841
13. M.A. Lieberman, A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, Wiley, New York, p. 81.
14. Buyle G., Depla D., Eufinger K., and De Gryse R. J. Phys. D: Appl. Phys. 37 (2004) 1639
15. Ishiia R., Matsumuraa K., Sakai A., and Sakata T. Appl. Surf. Sci. 169-170 (2001) 658
16. K. Eufinger, H. Tomaszewski, D. Depla, H. Poelman, D. Poelman, R. De Gryse, accepted for publication in Thin Solid Films.
17. Benka O., Pürstinger J., and Koyama A. Phys. Rev. A58 (1998) 2978
18. Calculated using SRIM : SRIM can be downloaded from http://www.srim.org.