Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model

New Journal of Physics

Volumn 11, Issue , 2009, Pages

  Bultinck, E ^a   Mahieu, S ^b   Depla, D ^b   Bogaerts, A ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

SPUTTER DEPOSITION; TIN; TITANIUM COMPOUNDS;

CATHODE CURRENTS; COLLISIONS MODELS; GAS RATIOS; ION FRACTIONS; MAGNETRON DISCHARGES; PARTICLE DENSITIES; PHYSICAL PROCESS; REACTIVE SPUTTER DEPOSITIONS; SPECTROMETRIC MEASUREMENTS;

TITANIUM NITRIDE;

EID: 63149182652     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/11/2/023039     Document Type: Article

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