The plasma properties adjacent to the target in a magnetron sputtering source

Plasma Sources Science and Technology

Volumn 5, Issue 4, 1996, Pages 622-631

  Bradley, J W ^a,b  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRONS; IONS; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; PLASMAS;

BOHM CRITERION; NEAR-TARGET REGION;

PLASMA SOURCES;

EID: 0030281858     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/4/003     Document Type: Article

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