Dynamic behaviour of the reactive sputtering process

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 421-424

  Kubart, T ^a   Kappertz, O ^a   Nyberg, T ^a   Berg, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

Magnetron; Process simulation; Reactive sputtering

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; HYSTERESIS; MAGNETRONS; PRESSURE MEASUREMENT;

PROCESS SIMULATION; PROCESSING CURVES; REACTIVE SPUTTERING;

SPUTTERING;

EID: 33748743892     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.250     Document Type: Article

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