Simulation of reactive sputtering kinetics in real in-line processing chambers

Thin Solid Films

Volumn 442, Issue 1-2, 2003, Pages 21-26

  Pflug, A ^a   Szyszka, B ^a   Niemann, J ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Process simulation; Reaction kinetics; Silicon oxide; Sputtering

Indexed keywords

COMPUTER SIMULATION; MONTE CARLO METHODS; PARTIAL PRESSURE; REACTION KINETICS; RUNGE KUTTA METHODS; SILICA; SUBSTRATES; XML;

PROCESSING CHAMBERS;

MAGNETRON SPUTTERING;

EID: 0141636299     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00932-5     Document Type: Conference Paper

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