Characterization of aluminum oxide thin films deposited on polycarbonate substrates by reactive magnetron sputtering

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 65, Issue 2, 1999, Pages 94-105

  Koski, K ^a,b,d   Holsa J ^a   Juliet, P ^b   Wang, Z H ^c   Aimo, R ^c   Pischow, K ^c  

^a UNIVERSITY OF TURKU   (Finland)

^b CEA GRENOBLE   (France)

^c Insinoorinkatu 7 FIN 50100   (Finland)

^d ÅBO AKADEMI UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL MODIFICATION; CRACK INITIATION; CROSSLINKING; MAGNETRON SPUTTERING; MASS SPECTROMETRY; POLYCARBONATES; RESIDUAL STRESSES; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION;

ALUMINUM OXIDE THIN FILMS; PLASMA TREATMENT; REACTIVE MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 0033570523     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00186-5     Document Type: Article

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