One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2

Journal of Physics D: Applied Physics

Volumn 36, Issue 15, 2003, Pages 1826-1833

  De Bleecker, K ^a   Herrebout, D ^a   Bogaerts, A ^a   Gijbels, R ^a   Descamps, P ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b Dow Corning SA Belgium   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; ELECTRONS; HELIUM; NITROGEN; OXYGEN; PLASMAS; POISSON DISTRIBUTION; RATE CONSTANTS;

CAPACITIVELY COUPLED PLASMAS;

SILANES;

EID: 0042734547     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/15/313     Document Type: Article

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