SCOPUS 정보 검색 플랫폼

Volumn 135, Issue 1, 2000, Pages 48-59

Novel reactive magnetron sputtering technique for producing insulating oxides of metal alloys and other compound thin films

(1) Safi, I a,b

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; MAGNETRON SPUTTERING; STOICHIOMETRY; THIN FILMS; VOLTAGE CONTROL;

REACTIVE SPUTTERING;

METALLIC FILMS;

METAL OXIDE; SPUTTERING;

EID: 0034351317 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(00)00985-3 Document Type: Article

Times cited : (9)

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