Multi-scale modeling of chemical vapor deposition processes for thin film technology

Journal of Crystal Growth

Volumn 303, Issue 1 SPEC. ISS., 2007, Pages 362-380

  Kleijn, C R ^a   Dorsman, R ^a   Kuijlaars, K J ^a   Okkerse, M ^a   van Santen, H ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

A1. Computer simulations; A1. Fluid flows; A1. Heat transfer; A1. Mass transfer; A3. Chemical vapor deposition process

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FLOW OF FLUIDS; HEAT TRANSFER; MASS TRANSFER; MATHEMATICAL MODELS; THICKNESS MEASUREMENT;

HYDRODYNAMIC REACTOR; LOADING EFFECTS; MULTI-SCALE SIMULATION; PARTICLE TRANSPORT;

THIN FILMS;

EID: 34047267808     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.12.062     Document Type: Article

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