Feature length-scale modeling of LPCVD and PECVD MEMS fabrication processes

Microsystem Technologies

Volumn 12, Issue 1-2 SPEC. ISS., 2005, Pages 137-142

  Musson, Lawrence C ^a   Ho, Pauline ^b   Plimpton, Steven J ^a   Schmidt, Rodney C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b Reaction Design   (United States)

Author keywords

CVD; Feature scale; Level set method; LPCVD; MEMS; PECVD

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; INTEGRATED CIRCUITS; MICROMACHINING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA;

FEATURE SCALE; LEVEL-SET METHOD; LPCVD; PECVD;

MICROELECTROMECHANICAL DEVICES;

EID: 30344481963     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-005-0011-0     Document Type: Conference Paper

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