Fluid-dynamics during vapor epitaxy and modeling

Progress in Crystal Growth and Characterization of Materials

Volumn 47, Issue 2-3, 2003, Pages 239-270

  Masi, Maurizio ^a   Di Stanislao, Marco ^a   Veneroni, Alessandro ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

A1. Fluid flows; A3. Chemical vapor deposition processes; B2. Semiconducting materials; Growth models; Multiscale modeling; Vapor phase epitaxy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FLOW OF FLUIDS; MICROELECTRONICS; OPTOELECTRONIC DEVICES; SEMICONDUCTOR MATERIALS; THICK FILMS; THIN FILMS; VAPOR PHASE EPITAXY;

CHEMICAL PARAMETERS; DEPOSITION CHEMISTRY; GROWTH MODELS; MULTISCALE MODELING;

FLUID DYNAMICS;

EID: 23344451412     PISSN: 09608974     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.pcrysgrow.2005.02.002     Document Type: Review

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