Chemical vapor deposition reactor design using small-scale diagnostic experiments combined with computational fluid dynamics simulations

Journal of the Electrochemical Society

Volumn 146, Issue 5, 1999, Pages 1780-1788

  Chae, Y K ^a   Egashira, Y ^b   Shimogaki, Y ^a   Sugawara, K ^c   Komiyama, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c NIHON UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; COMPUTER SOFTWARE; FILM GROWTH; MACHINE DESIGN; NUMERICAL METHODS; REACTION KINETICS; SILANES; SURFACE CHEMISTRY; TUNGSTEN COMPOUNDS;

SOFTWARE PACKAGE FLUENT; TUBULAR HOT-WALL REACTORS; TUNGSTEN HEXAFLUORIDE; TUNGSTEN SILICIDE;

CHEMICAL REACTORS;

EID: 0032688971     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391843     Document Type: Article

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