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Volumn 167, Issue 3-4, 1996, Pages 543-556

Reaction kinetics and transport phenomena underlying the low-pressure metalorganic chemical vapor deposition of GaAs

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COMPUTER SIMULATION; DECOMPOSITION; FILM GROWTH; FINITE ELEMENT METHOD; IONIZATION; KINETIC THEORY; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SURFACE PHENOMENA; TRANSPORT PROPERTIES;

EID: 0030259142     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(96)00277-1     Document Type: Article
Times cited : (31)

References (30)
  • 28
    • 0028519590 scopus 로고    scopus 로고
    • N.K. Ingle and T.J. Mountziaris, J. Fluid Mech. 277 (1994) 249; 316 (1996) 373.
    • (1996) J. Fluid Mech. , vol.316 , pp. 373
  • 30
    • 30244455937 scopus 로고
    • PhD Thesis, SUNY at Buffalo, Buffalo, New York
    • N.K. Ingle, PhD Thesis, SUNY at Buffalo, Buffalo, New York, 1995.
    • (1995)
    • Ingle, N.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.