Thermal modelling of RTP and RTCVD processes

Thin Solid Films

Volumn 365, Issue 2, 2000, Pages 307-321

  Kersch, A ^a   Schafbauer, T ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROELECTRONIC PROCESSING; NATURAL CONVECTION; OPTICAL PROPERTIES; RAPID THERMAL ANNEALING; THERMAL EFFECTS; THERMAL STRESS; THIN FILMS;

RAPID THERMAL CHEMICAL VAPOR DEPOSITION (RTCVD);

SEMICONDUCTING FILMS;

EID: 0033735022     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)01050-0     Document Type: Article

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