Ab initio molecular-orbital study on the surface reactions of methane and silane plasma chemical vapor deposition

Physical Review B - Condensed Matter and Materials Physics

Volumn 55, Issue 23, 1997, Pages 15467-15470

  Sato, Kota ^a   Haruta, Hitoshi ^a   Kumashiro, Yukinobu ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342970699     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.55.15467     Document Type: Article

References (11)

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