Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor

Journal of Crystal Growth

Volumn 293, Issue 2, 2006, Pages 475-484

  Cheng, T S ^a   Hsiao, M C ^a  

^a CHUNG HUA UNIVERSITY   (Taiwan)

Author keywords

A1. Computer simulation; A1. Convection; A1. Fluid flow; A3. MOCVD

Indexed keywords

COMPUTER SIMULATION; HEAT FLUX; HEAT TRANSFER; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REYNOLDS NUMBER;

BUOYANCY-TO-INERTIA RATIO; CONVECTION; GRASHOF NUMBER CONDITION; TRANSVERSE ROLLS;

FLOW OF FLUIDS;

EID: 33746410998     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.05.049     Document Type: Article

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